Simultaneous Offset Instrument Approach (SOIA)
An instrument landing system comprised of an ILS PRM, RNAV PRM or GLS PRM approach to one runway and an offset LDA PRM with glideslope or an RNAV PRM or GLS PRM approach utilizing vertical guidance to another where parallel runway spaced less than 3,000 feet and at least 750 feet apart. The approach courses converge by 2.5 to 3 degrees. Simultaneous close parallel PRM approach procedures apply up to the point where the approach course separation becomes 3,000 feet, at the offset MAP. From the offset MAP to the runway threshold, visual separation by the aircraft conducting the offset approach is utilized.